COMPOSITION AND METHOD FOR WASHING ADHESIVE POLYMER
Provided is a composition in which a decrease in etching rate over time is suppressed. A composition comprising: at least one of a fluorinated alkyl quaternary ammonium and a hydrate of a fluorinated alkyl quaternary ammonium; (A) an N-substituted amide compound having no active hydrogen on the nitr...
Gespeichert in:
| Hauptverfasser: | , |
|---|---|
| Format: | Patent |
| Sprache: | chi ; eng |
| Schlagworte: | |
| Online-Zugang: | Volltext bestellen |
| Tags: |
Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
|
| container_end_page | |
|---|---|
| container_issue | |
| container_start_page | |
| container_title | |
| container_volume | |
| creator | NAKAZAKI SUSUMU HAYASHI KOUTAROU |
| description | Provided is a composition in which a decrease in etching rate over time is suppressed. A composition comprising: at least one of a fluorinated alkyl quaternary ammonium and a hydrate of a fluorinated alkyl quaternary ammonium; (A) an N-substituted amide compound having no active hydrogen on the nitrogen atom and (B) dipropylene glycol dimethyl ether as aprotic solvents; and an antioxidant.
提供抑制了经时的蚀刻速度的降低的组合物。一种组合物，其包含：氟化烷基季铵和氟化烷基季铵的水合物中的至少1种；作为非质子性溶剂的(A)在氮原子上不具有活性氢的N-取代酰胺化合物、和(B)双丙甘醇二甲基醚；以及抗氧化剂。 |
| format | Patent |
| fullrecord | <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_CN115427547A</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>CN115427547A</sourcerecordid><originalsourceid>FETCH-epo_espacenet_CN115427547A3</originalsourceid><addsrcrecordid>eNrjZDB29vcN8A_2DPH091Nw9HNR8HUN8fB3UXDzD1IIdwz28PRzV3B08XAN9gxzVQjw94n0dQ3iYWBNS8wpTuWF0twMim6uIc4euqkF-fGpxQWJyal5qSXxzn6GhqYmRuamJuaOxsSoAQCozCcz</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>COMPOSITION AND METHOD FOR WASHING ADHESIVE POLYMER</title><source>esp@cenet</source><creator>NAKAZAKI SUSUMU ; HAYASHI KOUTAROU</creator><creatorcontrib>NAKAZAKI SUSUMU ; HAYASHI KOUTAROU</creatorcontrib><description>Provided is a composition in which a decrease in etching rate over time is suppressed. A composition comprising: at least one of a fluorinated alkyl quaternary ammonium and a hydrate of a fluorinated alkyl quaternary ammonium; (A) an N-substituted amide compound having no active hydrogen on the nitrogen atom and (B) dipropylene glycol dimethyl ether as aprotic solvents; and an antioxidant.
提供抑制了经时的蚀刻速度的降低的组合物。一种组合物，其包含：氟化烷基季铵和氟化烷基季铵的水合物中的至少1种；作为非质子性溶剂的(A)在氮原子上不具有活性氢的N-取代酰胺化合物、和(B)双丙甘醇二甲基醚；以及抗氧化剂。</description><language>chi ; eng</language><subject>ANIMAL AND VEGETABLE OILS, FATS, FATTY SUBSTANCES AND WAXES ; BASIC ELECTRIC ELEMENTS ; CANDLES ; CHEMISTRY ; CLEANING ; CLEANING IN GENERAL ; DETERGENT COMPOSITIONS ; DETERGENTS ; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ; ELECTRICITY ; FATTY ACIDS THEREFROM ; METALLURGY ; PERFORMING OPERATIONS ; PREVENTION OF FOULING IN GENERAL ; RECOVERY OF GLYCEROL ; RESIN SOAPS ; SEMICONDUCTOR DEVICES ; SOAP OR SOAP-MAKING ; TRANSPORTING ; USE OF SINGLE SUBSTANCES AS DETERGENTS</subject><creationdate>2022</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20221202&DB=EPODOC&CC=CN&NR=115427547A$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,776,881,25543,76294</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20221202&DB=EPODOC&CC=CN&NR=115427547A$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>NAKAZAKI SUSUMU</creatorcontrib><creatorcontrib>HAYASHI KOUTAROU</creatorcontrib><title>COMPOSITION AND METHOD FOR WASHING ADHESIVE POLYMER</title><description>Provided is a composition in which a decrease in etching rate over time is suppressed. A composition comprising: at least one of a fluorinated alkyl quaternary ammonium and a hydrate of a fluorinated alkyl quaternary ammonium; (A) an N-substituted amide compound having no active hydrogen on the nitrogen atom and (B) dipropylene glycol dimethyl ether as aprotic solvents; and an antioxidant.
提供抑制了经时的蚀刻速度的降低的组合物。一种组合物，其包含：氟化烷基季铵和氟化烷基季铵的水合物中的至少1种；作为非质子性溶剂的(A)在氮原子上不具有活性氢的N-取代酰胺化合物、和(B)双丙甘醇二甲基醚；以及抗氧化剂。</description><subject>ANIMAL AND VEGETABLE OILS, FATS, FATTY SUBSTANCES AND WAXES</subject><subject>BASIC ELECTRIC ELEMENTS</subject><subject>CANDLES</subject><subject>CHEMISTRY</subject><subject>CLEANING</subject><subject>CLEANING IN GENERAL</subject><subject>DETERGENT COMPOSITIONS</subject><subject>DETERGENTS</subject><subject>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</subject><subject>ELECTRICITY</subject><subject>FATTY ACIDS THEREFROM</subject><subject>METALLURGY</subject><subject>PERFORMING OPERATIONS</subject><subject>PREVENTION OF FOULING IN GENERAL</subject><subject>RECOVERY OF GLYCEROL</subject><subject>RESIN SOAPS</subject><subject>SEMICONDUCTOR DEVICES</subject><subject>SOAP OR SOAP-MAKING</subject><subject>TRANSPORTING</subject><subject>USE OF SINGLE SUBSTANCES AS DETERGENTS</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2022</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZDB29vcN8A_2DPH091Nw9HNR8HUN8fB3UXDzD1IIdwz28PRzV3B08XAN9gxzVQjw94n0dQ3iYWBNS8wpTuWF0twMim6uIc4euqkF-fGpxQWJyal5qSXxzn6GhqYmRuamJuaOxsSoAQCozCcz</recordid><startdate>20221202</startdate><enddate>20221202</enddate><creator>NAKAZAKI SUSUMU</creator><creator>HAYASHI KOUTAROU</creator><scope>EVB</scope></search><sort><creationdate>20221202</creationdate><title>COMPOSITION AND METHOD FOR WASHING ADHESIVE POLYMER</title><author>NAKAZAKI SUSUMU ; HAYASHI KOUTAROU</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_CN115427547A3</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>chi ; eng</language><creationdate>2022</creationdate><topic>ANIMAL AND VEGETABLE OILS, FATS, FATTY SUBSTANCES AND WAXES</topic><topic>BASIC ELECTRIC ELEMENTS</topic><topic>CANDLES</topic><topic>CHEMISTRY</topic><topic>CLEANING</topic><topic>CLEANING IN GENERAL</topic><topic>DETERGENT COMPOSITIONS</topic><topic>DETERGENTS</topic><topic>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</topic><topic>ELECTRICITY</topic><topic>FATTY ACIDS THEREFROM</topic><topic>METALLURGY</topic><topic>PERFORMING OPERATIONS</topic><topic>PREVENTION OF FOULING IN GENERAL</topic><topic>RECOVERY OF GLYCEROL</topic><topic>RESIN SOAPS</topic><topic>SEMICONDUCTOR DEVICES</topic><topic>SOAP OR SOAP-MAKING</topic><topic>TRANSPORTING</topic><topic>USE OF SINGLE SUBSTANCES AS DETERGENTS</topic><toplevel>online_resources</toplevel><creatorcontrib>NAKAZAKI SUSUMU</creatorcontrib><creatorcontrib>HAYASHI KOUTAROU</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>NAKAZAKI SUSUMU</au><au>HAYASHI KOUTAROU</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>COMPOSITION AND METHOD FOR WASHING ADHESIVE POLYMER</title><date>2022-12-02</date><risdate>2022</risdate><abstract>Provided is a composition in which a decrease in etching rate over time is suppressed. A composition comprising: at least one of a fluorinated alkyl quaternary ammonium and a hydrate of a fluorinated alkyl quaternary ammonium; (A) an N-substituted amide compound having no active hydrogen on the nitrogen atom and (B) dipropylene glycol dimethyl ether as aprotic solvents; and an antioxidant.
提供抑制了经时的蚀刻速度的降低的组合物。一种组合物，其包含：氟化烷基季铵和氟化烷基季铵的水合物中的至少1种；作为非质子性溶剂的(A)在氮原子上不具有活性氢的N-取代酰胺化合物、和(B)双丙甘醇二甲基醚；以及抗氧化剂。</abstract><oa>free_for_read</oa></addata></record> |
| fulltext | fulltext_linktorsrc |
| identifier | |
| ispartof | |
| issn | |
| language | chi ; eng |
| recordid | cdi_epo_espacenet_CN115427547A |
| source | esp@cenet |
| subjects | ANIMAL AND VEGETABLE OILS, FATS, FATTY SUBSTANCES AND WAXES BASIC ELECTRIC ELEMENTS CANDLES CHEMISTRY CLEANING CLEANING IN GENERAL DETERGENT COMPOSITIONS DETERGENTS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY FATTY ACIDS THEREFROM METALLURGY PERFORMING OPERATIONS PREVENTION OF FOULING IN GENERAL RECOVERY OF GLYCEROL RESIN SOAPS SEMICONDUCTOR DEVICES SOAP OR SOAP-MAKING TRANSPORTING USE OF SINGLE SUBSTANCES AS DETERGENTS |
| title | COMPOSITION AND METHOD FOR WASHING ADHESIVE POLYMER |
| url | https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-01-21T19%3A11%3A20IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-epo_EVB&rft_val_fmt=info:ofi/fmt:kev:mtx:patent&rft.genre=patent&rft.au=NAKAZAKI%20SUSUMU&rft.date=2022-12-02&rft_id=info:doi/&rft_dat=%3Cepo_EVB%3ECN115427547A%3C/epo_EVB%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_id=info:pmid/&rfr_iscdi=true |