Determination of radiation intensity and/or wavelength of process light
The invention relates generally to a method for determining the radiation intensity and/or wavelength of process light (E10), to a method for determining the process deviation (DEV) of a melting process, and to a method for closed-loop control of a melting process. In order to improve the determinat...
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Format: | Patent |
Sprache: | chi ; eng |
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Zusammenfassung: | The invention relates generally to a method for determining the radiation intensity and/or wavelength of process light (E10), to a method for determining the process deviation (DEV) of a melting process, and to a method for closed-loop control of a melting process. In order to improve the determination of the radiation intensity and/or wavelength of the process light of the melting process, the invention proposes the following steps: providing a power profile (P) for a section (dtPOI) of the path (x) as a model (MLM) for machine learning, in particular an input variable (IN) for a neural network, training the model (MLM) by means of the historical and/or synthetic power profile (PH) and the associated historical or synthetic radiation intensity (E10H) and/or wavelength 20 of the process light (E10), and determining the radiation intensity and/or wavelength of the process light (E10) as an output variable (OUT) of the model (MLM).
本发明总地来说涉及一种用于确定工艺光(E10)的辐射强度和/或波长的方法、一种用于确定熔融工艺的工艺偏差(DEV)的方法和一种用于闭环控制熔融工艺的方法。为了改 |
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