Etchant composition and method for manufacturing display device using same

Provided are an etchant composition and a method for manufacturing a display device using the same. The etching liquid composition according to one embodiment includes 9.0 to 9.9 wt% of an inorganic acid compound, 5.0 to 10.0 wt% of an inorganic salt compound, 35 to 45 wt% of an organic acid compound, 10 to 20 wt% of a lactate-based compound, and the balance of a solvent. 0.1 wt% to 1.0 wt% of an oxygen-containing nitrogen ring type compound; and a remainder of water for making the total weight of the entire composition 100 wt%, the inorganic acid compound having an acid dissociation constant (pKa) value of-1.0 to-3.0. 提供一种蚀刻液组合物及利用其的显示装置的制造方法。一实施例涉及的蚀刻液组合物包括9.0重量％至9.9重量％的无机酸化合物、5.0重量％至10.0重量％的无机盐化合物、35重量％至45重量％的有机酸化合物、10重量％至20重量％的乳酸盐系化合物、0.1重量％至1.0重量％的含氧的氮环型化合物以及用于使整个组合物的总重量成为100重量％的余量的水，上述无机酸化合物的酸解离常数(pKa)值为-1.0至-3.0。