Resourceful treatment method of hydrofluoric acid etching buffer waste liquid

The invention provides a hydrofluoric acid etching buffer waste liquid resourceful treatment method, which comprises: (1) mixing a buffer waste liquid and potassium hydroxide, and carrying out a reaction to obtain a reaction liquid and ammonia gas; (2) blowing off the ammonia gas obtained in the ste...

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Hauptverfasser: SHAN JIAWEI, QIAO FEI, HUA XIUFENG, YU KAI
Format: Patent
Sprache:chi ; eng
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Zusammenfassung:The invention provides a hydrofluoric acid etching buffer waste liquid resourceful treatment method, which comprises: (1) mixing a buffer waste liquid and potassium hydroxide, and carrying out a reaction to obtain a reaction liquid and ammonia gas; (2) blowing off the ammonia gas obtained in the step (1) into an acid solution for absorption to obtain an ammonium salt solution; (3) adjusting the pH value of the reaction liquid after the ammonia gas is blown off to be neutral, distilling, crystallizing and carrying out solid-liquid separation to obtain ethylene glycol and potassium fluoride; wherein the buffer waste liquid in the step (1) comprises water, ethylene glycol and ammonium fluoride. According to the resourceful treatment method provided by the invention, ethylene glycol and ammonium fluoride in the waste liquid are fully recycled, the originally harmful fluorine element is converted into a high-added-value product, meanwhile, the treatment process is simplified, the treatment cost is reduced, and the