Alkaline cleaning solution and preparation method thereof
The invention relates to an alkaline cleaning solution which comprises the following components in percentage by mass: 0.1-2.5% of a nonionic surfactant, 0.1-3.5% of alkali metal hydroxide, 0.1-3% of a metal chelating agent, 0.1-4% of a buffering agent and the balance of water. The invention also re...
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Format: | Patent |
Sprache: | chi ; eng |
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Zusammenfassung: | The invention relates to an alkaline cleaning solution which comprises the following components in percentage by mass: 0.1-2.5% of a nonionic surfactant, 0.1-3.5% of alkali metal hydroxide, 0.1-3% of a metal chelating agent, 0.1-4% of a buffering agent and the balance of water. The invention also relates to a preparation method of the alkaline cleaning solution. The alkaline cleaning solution is excellent in cleaning effect, can play a good cleaning role on residual proteins, organic ions, lipids and the like on the tube wall of the reaction cup, can effectively reduce the influence caused by the residual proteins, organic ions, lipids and metal ions, and is low in foam amount, easy to clean, good in reagent stability and low in cost. And a certain rust-proof and maintenance effect can be achieved on the instrument. The alkaline cleaning solution disclosed by the invention is simple in preparation method and low in reagent cost, the price of the alkaline cleaning solution is lower than that of an alkaline cle |
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