Defect detection method based on dual light and corresponding system

The invention provides a defect detection method based on dual light and a corresponding system, and the method comprises the steps: carrying out the visible light shooting of a to-be-detected target through a shooting device, and obtaining a visible light picture of the to-be-detected target; perfo...

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Hauptverfasser: ZHAO HAITAO, ZHOU XIANG, HU KA, PENG ZIJIAN, YUAN JUN, ZOU CHEN, LI YULEI, YANG YAN, FANG SHUHAN, CHEN YUAN, LI XUDONG, YANG QIFAN, HOU XIAOSONG, SHI WEIJUN, HAN XU, HUANG SHENG, LU CHENGDONG, HAN FEI, LI TING, HUANG PINGCHUAN
Format: Patent
Sprache:chi ; eng
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Zusammenfassung:The invention provides a defect detection method based on dual light and a corresponding system, and the method comprises the steps: carrying out the visible light shooting of a to-be-detected target through a shooting device, and obtaining a visible light picture of the to-be-detected target; performing type analysis on the visible light picture through a preset target detection model, and judging whether the type of the to-be-detected target in the visible light picture is a preset target type or not; if the output result of the target detection model is yes, carrying out infrared light shooting on the to-be-detected target through shooting equipment, and obtaining an infrared light picture of the to-be-detected target; and performing defect analysis on the infrared light picture through a preset defect detection model, obtaining the defect of the to-be-detected target according to a defect analysis result, and marking the defect. According to the invention, the accuracy and efficiency of defect detection c