Defect detection method based on dual light and corresponding system
The invention provides a defect detection method based on dual light and a corresponding system, and the method comprises the steps: carrying out the visible light shooting of a to-be-detected target through a shooting device, and obtaining a visible light picture of the to-be-detected target; perfo...
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Format: | Patent |
Sprache: | chi ; eng |
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Zusammenfassung: | The invention provides a defect detection method based on dual light and a corresponding system, and the method comprises the steps: carrying out the visible light shooting of a to-be-detected target through a shooting device, and obtaining a visible light picture of the to-be-detected target; performing type analysis on the visible light picture through a preset target detection model, and judging whether the type of the to-be-detected target in the visible light picture is a preset target type or not; if the output result of the target detection model is yes, carrying out infrared light shooting on the to-be-detected target through shooting equipment, and obtaining an infrared light picture of the to-be-detected target; and performing defect analysis on the infrared light picture through a preset defect detection model, obtaining the defect of the to-be-detected target according to a defect analysis result, and marking the defect. According to the invention, the accuracy and efficiency of defect detection c |
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