Deposition system and method for depositing material from target to substrate in substrate processing chamber

A deposition system capable of cleaning itself by removing a target material deposited on a surface of a collimator is provided. A deposition system according to the present disclosure includes a substrate processing chamber. The deposition system includes: a substrate susceptor in a substrate processing chamber, the substrate susceptor configured to support a substrate; a target surrounding the substrate processing chamber; and a collimator having a plurality of hollow structures disposed between the target and the substrate, a vibration generating unit, and a clean gas outlet. 提供一种能够通过移除沉积在准直器的表面上的靶材料来清洁自身的沉积系统。根据本公开的沉积系统包括衬底处理室。所述沉积系统包括：衬底基座，位于衬底处理室中，所述衬底基座被配置成对衬底进行支撑；靶，包围衬底处理室；以及准直器，具有设置在靶与衬底之间的多个中空结构、振动产生单元、及清洁气体出口。