Method of conditioning plasma processing chamber

A method for processing one or more substrates in a plasma processing chamber is provided. A plurality of cycles are provided, where each cycle includes providing a pre-coating process, processing at least one substrate within a plasma processing chamber, and cleaning the plasma processing chamber....

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	WILSON NEIL MARSHALL, RAMACHANDRAN, SEETHARAMAN, ROSCZEWSKI, NIKLAS
Format:	Patent
Sprache:	chi ; eng
Schlagworte:	BASIC ELECTRIC ELEMENTS ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY SEMICONDUCTOR DEVICES
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