Preparation method of wafer surface granularity standard sample wafer and standard sample wafer

The invention provides a preparation method of a wafer surface granularity standard sample wafer and the standard sample wafer. The method comprises the following steps: making a granularity standard template structure diagram based on a wafer with a determined size; the granularity standard template structure diagram comprises a plurality of cylindrical arrays with different sizes; manufacturing a target mask plate according to the granularity standard template structure diagram, and transferring a pattern on the target mask plate to the wafer by utilizing a photoetching process to obtain a target wafer; and etching the target wafer by adopting an etching process to obtain a wafer surface granularity standard sample wafer. According to the invention, the service life of the wafer surface granularity standard sample wafer can be prolonged. 本发明提供一种晶圆表面颗粒度标准样片的制备方法及标准样片。该方法包括基于已确定尺寸的晶圆片，制作颗粒度标准样板结构图；所述颗粒度标准样板结构图中包括多个不同尺寸的圆柱阵列；按照所述颗粒度标准样板结构图制作目标掩模板，并利用光刻工艺，将所述目标掩模板上的图形转移到所述晶圆片上，得到目标晶圆片；采用刻蚀工艺对所述目标晶圆片进行刻蚀，得到晶圆表面颗