Standard sample plate value setting method and device, terminal equipment and standard sample plate
The invention is suitable for the technical field of microelectronic metering, and provides a standard sample plate value setting method and device, terminal equipment and a standard sample plate. The method comprises the following steps: acquiring a feature image of a prepared standard sample plate...
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Format: | Patent |
Sprache: | chi ; eng |
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Zusammenfassung: | The invention is suitable for the technical field of microelectronic metering, and provides a standard sample plate value setting method and device, terminal equipment and a standard sample plate. The method comprises the following steps: acquiring a feature image of a prepared standard sample plate; wherein the standard sample plate is a wafer etched with a plurality of hollow columnar structures, and the feature image comprises a bottom surface image corresponding to the hollow columnar structures; establishing a rectangular coordinate system on the feature image, determining contour point coordinates of the bottom surface image, and determining circle center coordinates and radius of the bottom surface image according to the contour point coordinates; and selecting a plurality of fixed value areas on the feature image, respectively determining the average radius of each fixed value area according to the number and radius of the bottom surface images in each fixed value area, and determining the standard pa |
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