Method for growing large-size monocrystal diamond based on side bonding splicing

The invention discloses a method for growing large-size monocrystal diamond based on side bonding splicing, and belongs to the field of diamond semiconductor growth. A mosaic spliced substrate is formed by splicing single crystal diamond seed crystals through side surface bonding, CVD diamond is epi...

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Hauptverfasser: LIU JINLONG, ZHAO SHANGMAN, WEI JUNJUN, LI SHUTONG, LI CHENGMING, ZHENG YUTING, ZHU ZILING, WANG PENG, QIAO GUANZHONG, ZHANG JIANJUN, CHEN LIANGXIAN, OUYANG XIAOPING
Format: Patent
Sprache:chi ; eng
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Zusammenfassung:The invention discloses a method for growing large-size monocrystal diamond based on side bonding splicing, and belongs to the field of diamond semiconductor growth. A mosaic spliced substrate is formed by splicing single crystal diamond seed crystals through side surface bonding, CVD diamond is epitaxially grown on the substrate, and the process comprises the following steps of: a, polishing the side surface of the single crystal diamond to obtain a smooth vertical side surface; b, performing Ar < + > ion beam bombardment on the side surface of the diamond seed crystal to remove gas and natural oxide adsorbed on the side surface; c, plating a bonding metal film on the side surface of the seed crystal; d, quickly bonding the coated seed crystal or the uncoated seed crystal subjected to Ar < + > treatment, and tightly pressing the coated seed crystal or the uncoated seed crystal subjected to Ar < + > treatment; e, carrying out polishing treatment on the spliced substrate on the same polishing workpiece; and f,