Micro-CT detector coating method and mask

The embodiment of the invention provides a Micro-CT detector film coating method and a mask. The Micro-CT detector coating method comprises the following steps: covering a prefabricated electron microscope grid on a Micro-CT detector single crystal, and because a target crystal face, needing to be coated, of the Micro-CT detector single crystal is exposed on the prefabricated electron microscope grid, vacuum coating can be directly carried out on the target crystal face to prepare the Micro-CT detector pixelated electrode array. The manufacturing cost of the electron microscope grid is lower than that of a fine metal mask, so that the cost of the coating process of the Micro-CT detector can be effectively reduced. 本发明实施例提供了一种Micro-CT探测器镀膜方法、一种掩膜。其中，Micro-CT探测器镀膜方法包括：将预制电子显微镜载网掩盖在Micro-CT探测器单晶上，由于预制电子显微镜载网暴露有Micro-CT探测器单晶需要镀膜的目标晶面，因而可以直接对目标晶面进行真空镀膜，来制备得到Micro-CT探测器像素化电极阵列。由于电子显微镜载网的制造成本较精细金属掩模版低，能有效降低对Micro-CT探测器进行镀膜过程的成本。