Method and system for cleaning surface of photomask

The invention discloses a method and a system for cleaning a surface of a photomask. The method for cleaning the surface of the photomask comprises the following steps: capturing the photomask from a photomask library and transferring the photomask to a first exposure device; the surface of the reti...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	SHI BAIMING, LIAO QIHONG
Format:	Patent
Sprache:	chi ; eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY CLEANING CLEANING IN GENERAL ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PERFORMING OPERATIONS PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS PREVENTION OF FOULING IN GENERAL TRANSPORTING
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