Method and system for cleaning surface of photomask

The invention discloses a method and a system for cleaning a surface of a photomask. The method for cleaning the surface of the photomask comprises the following steps: capturing the photomask from a photomask library and transferring the photomask to a first exposure device; the surface of the reticle is cleaned by irradiating the surface of the reticle with extreme ultraviolet radiation for a predetermined irradiation time in the first exposure device. After cleaning the surface of the reticle, the reticle is transferred to a second exposure device for lithography operations. 一种清洁光罩的表面的方法与系统，清洁光罩的表面的方法包括：从光罩库撷取光罩且将光罩转移至第一曝光装置。在第一曝光装置中以极紫外辐射在预定照射时间照射光罩的表面来清洁光罩的表面。在清洁光罩的表面之后，将光罩转移至用于微影操作的第二曝光装置。