End-of-life monitoring of dynamic airlock septum and pupil facet mirror and detection of septum rupture in lithographic apparatus

Embodiments herein describe methods, apparatuses, and systems for fracture detection and end-of-life monitoring of dynamic airlock (DGL) diaphragms and pupil facet mirrors in lithographic apparatuses. A method for detecting a rupture of a dynamic airlock diaphragm in a lithographic apparatus include...

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Hauptverfasser:	ZHOU PING, HUANG ZHUANGXIONG, HENDRIKS JIMMY, LYONS JOSEPH HARRY, GILISSEN, RENIER, THEODORUS, MARTINUS
Format:	Patent
Sprache:	chi ; eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS
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