End-of-life monitoring of dynamic airlock septum and pupil facet mirror and detection of septum rupture in lithographic apparatus
Embodiments herein describe methods, apparatuses, and systems for fracture detection and end-of-life monitoring of dynamic airlock (DGL) diaphragms and pupil facet mirrors in lithographic apparatuses. A method for detecting a rupture of a dynamic airlock diaphragm in a lithographic apparatus include...
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Format: | Patent |
Sprache: | chi ; eng |
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Zusammenfassung: | Embodiments herein describe methods, apparatuses, and systems for fracture detection and end-of-life monitoring of dynamic airlock (DGL) diaphragms and pupil facet mirrors in lithographic apparatuses. A method for detecting a rupture of a dynamic airlock diaphragm in a lithographic apparatus includes irradiating the dynamic airlock diaphragm with a measurement beam using a radiation source, where the dynamic airlock diaphragm is arranged between the wafer and projection optics of the lithographic apparatus; and determining whether any radiation from the measurement beam is reflected from the dynamic airlock diaphragm by using reflection collection optics, where the reflection collection optics are disposed above the dynamic airlock diaphragm. If no radiation is reflected from the dynamic airlock diaphragm, a fracture in the dynamic airlock diaphragm is detected. If radiation is reflected from the dynamic airlock diaphragm, the dynamic airlock diaphragm is not ruptured.
本文中的实施例描述用于在光刻设备中的动态气锁(DGL)隔膜和光瞳琢面反射镜的破裂 |
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