METHOD FOR DRY-FILTERING A FORES-CONTAINING GAS FLOW AND FILTER DEVICE FOR CLEANING A FORES

METHOD FOR DRY-FILTERING A FORES-CONTAINING GAS FLOW AND FILTER DEVICE FOR CLEANING A FORES

The invention relates to a method for dry-filtering a gas stream (44) carrying foreign matters, in particular in a filter device for purifying exhaust gases produced in additive manufacturing techniques, comprising: feeding a raw material gas stream (44) containing foreign matters into a raw materia...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser: DANDORFER, SEBASTIAN, BETHKE, DINO, RU SCH, MAXIMILIAN, HAJEK STEFAN, HERDING WALTER, HERDING URS, RABINSTEIN KLAUS, SCHAAL THOMAS
Format: Patent
Sprache:chi ; eng
Schlagworte:
ADDITIVE MANUFACTURING TECHNOLOGY
ADDITIVE MANUFACTURING, i.e. MANUFACTURING OFTHREE-DIMENSIONAL [3-D] OBJECTS BY ADDITIVE DEPOSITION, ADDITIVEAGGLOMERATION OR ADDITIVE LAYERING, e.g. BY 3-D PRINTING,STEREOLITHOGRAPHY OR SELECTIVE LASER SINTERING
PERFORMING OPERATIONS
PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
SEPARATION
TRANSPORTING
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Beschreibung
Zusammenfassung:The invention relates to a method for dry-filtering a gas stream (44) carrying foreign matters, in particular in a filter device for purifying exhaust gases produced in additive manufacturing techniques, comprising: feeding a raw material gas stream (44) containing foreign matters into a raw material gas space (15) of a filter unit, the filter unit is provided with at least one filter surface for separating a raw material gas side from a clean gas side; an oxidizing agent (112) is fed into a reaction zone, which is located downstream of the filter surface on the raw gas side, such that foreign matter contained in the substances cleared from the filter surface and/or in the raw gas stream (44) reacts with the oxidizing agent (112) within the reaction zone. 一种用于干式过滤携带异物的气体流(44)的方法，特别是在用于净化在增材制造技术中产生的废气的过滤器装置中，该方法包括：将含有异物的原料气体流(44)供给到过滤器单元的原料气体空间(15)中，该过滤器单元具有将原料气体侧与清洁气体侧分隔开的至少一个过滤器表面；将氧化剂(112)供给到反应区域中，该反应区域位于原气体侧上的过滤器表面的下游，使得包含在从过滤器表面清除的物质中和/或原料气体流(44)中的异物在反应区域内与氧化剂(112)反应。