Wafer surface granularity detector adjusting method and device and terminal equipment
The invention is suitable for the technical field of microelectronic metering testing, and provides a wafer surface granularity detector adjusting method and device and terminal equipment. The method comprises the following steps: acquiring particle data and a standard particle number of particles i...
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| creator | WANG WEI LI SUOYIN ZHANG JIAHUAN ZHANG XIAODONG WU AIHUA HAN ZHIGUO |
| description | The invention is suitable for the technical field of microelectronic metering testing, and provides a wafer surface granularity detector adjusting method and device and terminal equipment. The method comprises the following steps: acquiring particle data and a standard particle number of particles in a standard particle sample plate; determining a projection area range corresponding to the standard particles according to the number of the standard particles and the particle data; determining a standard projection area corresponding to the standard particle according to the projection area range; and acquiring particle data and standard particle number of particles in the standard particle sample plates with different standard particle sizes, repeating the steps, and determining a particle size-projection area relationship according to the obtained standard projection areas under different standard particle sizes, so that relevant parameters of the calibrated detector are calibrated according to the particle s |
| format | Patent |
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The method comprises the following steps: acquiring particle data and a standard particle number of particles in a standard particle sample plate; determining a projection area range corresponding to the standard particles according to the number of the standard particles and the particle data; determining a standard projection area corresponding to the standard particle according to the projection area range; and acquiring particle data and standard particle number of particles in the standard particle sample plates with different standard particle sizes, repeating the steps, and determining a particle size-projection area relationship according to the obtained standard projection areas under different standard particle sizes, so that relevant parameters of the calibrated detector are calibrated according to the particle s</description><language>chi ; eng</language><subject>CALCULATING ; COMPUTING ; COUNTING ; IMAGE DATA PROCESSING OR GENERATION, IN GENERAL ; INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIRCHEMICAL OR PHYSICAL PROPERTIES ; MEASURING ; PHYSICS ; TESTING</subject><creationdate>2022</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20221021&DB=EPODOC&CC=CN&NR=115219391A$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,780,885,25564,76547</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20221021&DB=EPODOC&CC=CN&NR=115219391A$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>WANG WEI</creatorcontrib><creatorcontrib>LI SUOYIN</creatorcontrib><creatorcontrib>ZHANG JIAHUAN</creatorcontrib><creatorcontrib>ZHANG XIAODONG</creatorcontrib><creatorcontrib>WU AIHUA</creatorcontrib><creatorcontrib>HAN ZHIGUO</creatorcontrib><title>Wafer surface granularity detector adjusting method and device and terminal equipment</title><description>The invention is suitable for the technical field of microelectronic metering testing, and provides a wafer surface granularity detector adjusting method and device and terminal equipment. 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| subjects | CALCULATING COMPUTING COUNTING IMAGE DATA PROCESSING OR GENERATION, IN GENERAL INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIRCHEMICAL OR PHYSICAL PROPERTIES MEASURING PHYSICS TESTING |
| title | Wafer surface granularity detector adjusting method and device and terminal equipment |
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