Wafer surface granularity detector adjusting method and device and terminal equipment

The invention is suitable for the technical field of microelectronic metering testing, and provides a wafer surface granularity detector adjusting method and device and terminal equipment. The method comprises the following steps: acquiring particle data and a standard particle number of particles in a standard particle sample plate; determining a projection area range corresponding to the standard particles according to the number of the standard particles and the particle data; determining a standard projection area corresponding to the standard particle according to the projection area range; and acquiring particle data and standard particle number of particles in the standard particle sample plates with different standard particle sizes, repeating the steps, and determining a particle size-projection area relationship according to the obtained standard projection areas under different standard particle sizes, so that relevant parameters of the calibrated detector are calibrated according to the particle s