Wafer calibration mechanism

The invention discloses a wafer calibration mechanism, and the mechanism comprises a calibration table which is provided with a bearing plate at the top; the positioning calibration assembly is rotatably mounted in the central area of the calibration table; the clamping assembly is movably mounted o...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser: WU HUA, XU ZHENGUANG, YUAN BAOCUN
Format: Patent
Sprache:chi ; eng
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Beschreibung
Zusammenfassung:The invention discloses a wafer calibration mechanism, and the mechanism comprises a calibration table which is provided with a bearing plate at the top; the positioning calibration assembly is rotatably mounted in the central area of the calibration table; the clamping assembly is movably mounted on the calibration table; wherein a wafer to be calibrated is supported above the bearing plate, a calibration opening is formed in the periphery of the wafer, a photoelectric sensor is arranged on the bearing plate, and the photoelectric sensor is used for calibrating the wafer; and the positioning calibration assembly is used for limiting the to-be-calibrated wafer located on the bearing plate, and meanwhile, under the action of a driving force, the positioning calibration assembly drives the to-be-calibrated wafer to rotate in a rotating direction, so that the calibration port is matched with the photoelectric sensor to calibrate the wafer. According to the invention, the positioning-calibration integrated operat