Treatment device and method for conditioning gas flow

The present disclosure relates to a treatment device and method for conditioning a gas flow. A method includes initiating a gas flow of a first gas parallel to a wall of an interface module to create an air curtain across an opening defined in the wall. The method includes moving the interface door to expose the opening, where the air curtain prevents a second gas within the interface module from passing through the opening. The method includes transferring the semiconductor wafer through the opening, and moving the interface gate to cover the opening. The method includes aborting the gas flow of the first gas after moving the interface door to cover the opening. 本公开涉及用于调节气体流的处理装置和方法。一种方法包括平行于接口模块的壁发起第一气体的气体流，以跨壁中限定的开口创建空气幕。该方法包括移动接口门以露出开口，其中，空气幕阻止接口模块内的第二气体通过开口。该方法包括通过开口转移半导体晶圆，并且移动接口门以覆盖开口。该方法包括在移动接口门以覆盖开口之后，中止第一气体的气体流。