Mask coating LCVD carrier gas concentration adjusting and measuring equipment

The invention discloses carrier gas concentration adjusting and measuring equipment for mask plate coating LCVD. The carrier gas concentration adjusting and measuring equipment comprises a carrier gas path D, an adjusting gas path C, a working gas path B and a measuring gas path E, the carrier gas p...

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Bibliographische Detailangaben
1. Verfasser:	WANG YATENG
Format:	Patent
Sprache:	chi ; eng
Schlagworte:	INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIRCHEMICAL OR PHYSICAL PROPERTIES MEASURING PHYSICS TESTING
Online-Zugang:	Volltext bestellen
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