Mask coating LCVD carrier gas concentration adjusting and measuring equipment
The invention discloses carrier gas concentration adjusting and measuring equipment for mask plate coating LCVD. The carrier gas concentration adjusting and measuring equipment comprises a carrier gas path D, an adjusting gas path C, a working gas path B and a measuring gas path E, the carrier gas p...
Gespeichert in:
| 1. Verfasser: | |
|---|---|
| Format: | Patent |
| Sprache: | chi ; eng |
| Schlagworte: | |
| Online-Zugang: | Volltext bestellen |
| Tags: |
Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
|
| Zusammenfassung: | The invention discloses carrier gas concentration adjusting and measuring equipment for mask plate coating LCVD. The carrier gas concentration adjusting and measuring equipment comprises a carrier gas path D, an adjusting gas path C, a working gas path B and a measuring gas path E, the carrier gas path D and the adjusting gas path C are connected in parallel, and the working gas path B and the measuring gas path E are connected in parallel and are both connected to the output ends of the carrier gas path D and the adjusting gas path C; and the measuring gas circuit E comprises a measuring valve Z3 and a gas concentration measuring device 5 connected to the output end of the measuring valve Z3. According to the mask coating LCVD carrier gas concentration adjusting and measuring equipment disclosed by the invention, the content of Cr (CO) 6 in carrier gas is detected by utilizing the Lambert-Beer law, the LCVD carrier gas concentration and the content of Cr (CO) 6 in the carrier gas are known in time, and the m |
|---|