Thermal management for instrument including plasma source

A thermal management configuration for an analysis system that includes a plasma source, such as an inductively coupled plasma source, is disclosed. An analysis system may include a plasma source configured to receive and ionize a sample to produce an ionized sample; and an instrument, such as a mass spectrometer or an optical emission spectrometer, configured to receive and analyze the ionized sample. The thermal shield may be located between the plasma source and the instrument, and the thermal shield may be constructed and arranged to direct heating gas and/or plasma from the plasma source away from the instrument. In some cases, a heating gas and/or plasma may be extracted from a chamber containing a plasma source. 公开了用于包括等离子体源、诸如感应耦合等离子体源的分析系统的热管理配置。分析系统可以包括：等离子体源，该等离子体源被配置为接收和电离样品以产生电离样品；以及仪器，诸如质谱仪或光学发射光谱仪，被配置为接收和分析电离样品。热屏蔽可以位于等离子体源和仪器之间，以及热屏蔽可以被构造和布置为引导来自等离子体源的加热气体和/或等离子体远离仪器。在一些情况下，可以从包含等离子体源的腔室中提取加热气体和/或等离子体。