Method for forming ultraviolet radiation responsive metal oxide-containing films
A method for forming an ultraviolet (UV) radiation responsive metal oxide containing film is disclosed. The method may include depositing a UV radiation responsive metal oxide-containing film on a substrate by heating the substrate to a deposition temperature of less than 400 DEG C, contacting the s...
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| creator | HUOTARI HANNU MAES JAN WILLEM |
| description | A method for forming an ultraviolet (UV) radiation responsive metal oxide containing film is disclosed. The method may include depositing a UV radiation responsive metal oxide-containing film on a substrate by heating the substrate to a deposition temperature of less than 400 DEG C, contacting the substrate with a first gas phase reactant comprising a metal component, a hydrogen component, and a carbon component, and contacting the substrate with a second gas phase reactant comprising an oxygen-containing precursor, wherein a region of the UV radiation-responsive metal oxide-containing film after UV irradiation has a first etch rate and a region of the UV radiation-responsive metal oxide-containing film not irradiated with UV radiation has a second etch rate, where the second etch rate is different than the first etch rate.
公开了一种用于形成紫外(UV)辐射响应性含金属氧化物的膜的方法。所述方法可包括：在衬底上沉积UV辐射响应性含金属氧化物的膜，做法是将衬底加热到低于400℃的沉积温度，使衬底与包括金属组分、氢组分和碳组分的第一气相反应物接触，并使衬底与包含含氧前体的第二气相反应物接触，其中UV辐射响应性含金属氧化物的膜的区域在UV照射后具有第一蚀刻速率而未用UV辐射照射的UV辐射响应性含金属 |
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公开了一种用于形成紫外(UV)辐射响应性含金属氧化物的膜的方法。所述方法可包括：在衬底上沉积UV辐射响应性含金属氧化物的膜，做法是将衬底加热到低于400℃的沉积温度，使衬底与包括金属组分、氢组分和碳组分的第一气相反应物接触，并使衬底与包含含氧前体的第二气相反应物接触，其中UV辐射响应性含金属氧化物的膜的区域在UV照射后具有第一蚀刻速率而未用UV辐射照射的UV辐射响应性含金属</description><language>chi ; eng</language><subject>CHEMICAL SURFACE TREATMENT ; CHEMISTRY ; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL ; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL ; COATING MATERIAL WITH METALLIC MATERIAL ; COATING METALLIC MATERIAL ; DIFFUSION TREATMENT OF METALLIC MATERIAL ; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL ; METALLURGY ; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION</subject><creationdate>2022</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20220923&DB=EPODOC&CC=CN&NR=115094399A$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,776,881,25544,76293</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20220923&DB=EPODOC&CC=CN&NR=115094399A$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>HUOTARI HANNU</creatorcontrib><creatorcontrib>MAES JAN WILLEM</creatorcontrib><title>Method for forming ultraviolet radiation responsive metal oxide-containing films</title><description>A method for forming an ultraviolet (UV) radiation responsive metal oxide containing film is disclosed. The method may include depositing a UV radiation responsive metal oxide-containing film on a substrate by heating the substrate to a deposition temperature of less than 400 DEG C, contacting the substrate with a first gas phase reactant comprising a metal component, a hydrogen component, and a carbon component, and contacting the substrate with a second gas phase reactant comprising an oxygen-containing precursor, wherein a region of the UV radiation-responsive metal oxide-containing film after UV irradiation has a first etch rate and a region of the UV radiation-responsive metal oxide-containing film not irradiated with UV radiation has a second etch rate, where the second etch rate is different than the first etch rate.
公开了一种用于形成紫外(UV)辐射响应性含金属氧化物的膜的方法。所述方法可包括：在衬底上沉积UV辐射响应性含金属氧化物的膜，做法是将衬底加热到低于400℃的沉积温度，使衬底与包括金属组分、氢组分和碳组分的第一气相反应物接触，并使衬底与包含含氧前体的第二气相反应物接触，其中UV辐射响应性含金属氧化物的膜的区域在UV照射后具有第一蚀刻速率而未用UV辐射照射的UV辐射响应性含金属</description><subject>CHEMICAL SURFACE TREATMENT</subject><subject>CHEMISTRY</subject><subject>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</subject><subject>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</subject><subject>COATING MATERIAL WITH METALLIC MATERIAL</subject><subject>COATING METALLIC MATERIAL</subject><subject>DIFFUSION TREATMENT OF METALLIC MATERIAL</subject><subject>INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL</subject><subject>METALLURGY</subject><subject>SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2022</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZAjwTS3JyE9RSMsvAuHczLx0hdKckqLEssz8nNQShaLElMzEksz8PIWi1OKC_LzizLJUhdzUksQchfyKzJRU3eT8vJLEzDyQvrTMnNxiHgbWtMSc4lReKM3NoOjmGuLsoZtakB8PNCIxOTUvtSTe2c_Q0NTA0sTY0tLRmBg1AAjROEU</recordid><startdate>20220923</startdate><enddate>20220923</enddate><creator>HUOTARI HANNU</creator><creator>MAES JAN WILLEM</creator><scope>EVB</scope></search><sort><creationdate>20220923</creationdate><title>Method for forming ultraviolet radiation responsive metal oxide-containing films</title><author>HUOTARI HANNU ; MAES JAN WILLEM</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_CN115094399A3</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>chi ; eng</language><creationdate>2022</creationdate><topic>CHEMICAL SURFACE TREATMENT</topic><topic>CHEMISTRY</topic><topic>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</topic><topic>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</topic><topic>COATING MATERIAL WITH METALLIC MATERIAL</topic><topic>COATING METALLIC MATERIAL</topic><topic>DIFFUSION TREATMENT OF METALLIC MATERIAL</topic><topic>INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL</topic><topic>METALLURGY</topic><topic>SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION</topic><toplevel>online_resources</toplevel><creatorcontrib>HUOTARI HANNU</creatorcontrib><creatorcontrib>MAES JAN WILLEM</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>HUOTARI HANNU</au><au>MAES JAN WILLEM</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>Method for forming ultraviolet radiation responsive metal oxide-containing films</title><date>2022-09-23</date><risdate>2022</risdate><abstract>A method for forming an ultraviolet (UV) radiation responsive metal oxide containing film is disclosed. The method may include depositing a UV radiation responsive metal oxide-containing film on a substrate by heating the substrate to a deposition temperature of less than 400 DEG C, contacting the substrate with a first gas phase reactant comprising a metal component, a hydrogen component, and a carbon component, and contacting the substrate with a second gas phase reactant comprising an oxygen-containing precursor, wherein a region of the UV radiation-responsive metal oxide-containing film after UV irradiation has a first etch rate and a region of the UV radiation-responsive metal oxide-containing film not irradiated with UV radiation has a second etch rate, where the second etch rate is different than the first etch rate.
公开了一种用于形成紫外(UV)辐射响应性含金属氧化物的膜的方法。所述方法可包括：在衬底上沉积UV辐射响应性含金属氧化物的膜，做法是将衬底加热到低于400℃的沉积温度，使衬底与包括金属组分、氢组分和碳组分的第一气相反应物接触，并使衬底与包含含氧前体的第二气相反应物接触，其中UV辐射响应性含金属氧化物的膜的区域在UV照射后具有第一蚀刻速率而未用UV辐射照射的UV辐射响应性含金属</abstract><oa>free_for_read</oa></addata></record> |
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| subjects | CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL METALLURGY SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION |
| title | Method for forming ultraviolet radiation responsive metal oxide-containing films |
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