Array substrate and manufacturing method thereof
The invention relates to an array substrate and a manufacturing method thereof, and belongs to the technical field of display, the array substrate comprises a substrate, a gate, a gate insulating layer, an active layer, a source electrode and a drain electrode, the substrate, the gate, the gate insu...
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Format: | Patent |
Sprache: | chi ; eng |
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Zusammenfassung: | The invention relates to an array substrate and a manufacturing method thereof, and belongs to the technical field of display, the array substrate comprises a substrate, a gate, a gate insulating layer, an active layer, a source electrode and a drain electrode, the substrate, the gate, the gate insulating layer and the active layer are sequentially stacked in the first direction, the source electrode and the drain electrode are arranged on the active layer, a groove is formed in the substrate, and the gate is embedded in the groove; the surface of the side, close to the gate insulating layer, of the gate is flush with the surface of the side, close to the gate insulating layer, of the substrate. According to the array substrate, the grid electrode is completely embedded in the substrate, the signal line width can be increased according to requirements, meanwhile, leveling of the array substrate is facilitated, the risks of climbing faults of various thin film lines in the follow-up film coating and line manuf |
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