Cleaning device and method

The invention provides a cleaning device and method.The cleaning device comprises a factory affair control system, a first pressure regulating valve, a gas pressure regulating system and two fluid nozzles; a first outlet end of the factory control system is connected with a first inlet end of the ga...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser:	ZHU ZHICHAO, ZHANG JIE, LI YANGBAI, JIANG XIAOYU, LI SHENGLI
Format:	Patent
Sprache:	chi ; eng
Schlagworte:	BASIC ELECTRIC ELEMENTS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY SEMICONDUCTOR DEVICES
Online-Zugang:	Volltext bestellen
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