Cleaning device and method

The invention provides a cleaning device and method.The cleaning device comprises a factory affair control system, a first pressure regulating valve, a gas pressure regulating system and two fluid nozzles; a first outlet end of the factory control system is connected with a first inlet end of the gas pressure adjusting system through a first pipeline; a first outlet end of the gas pressure regulating system is connected with a first inlet end of the two-fluid nozzle through a second pipeline, and a first pressure regulating valve is arranged on the second pipeline; a second outlet end of the factory control system is used for conveying liquid medicine to the two-fluid nozzle; and the two-fluid nozzle is used for spraying the mixed liquid medicine and gas to the wafer so as to clean the wafer. According to the invention, the first pressure regulating valve is arranged on the second pipeline, so that the two-fluid pressure borne by the wafer can be conveniently regulated, and the wafer can be prevented from bei