Resistance element metal layer impurity detection method
According to the method for detecting the impurities in the metal layer of the resistor element, the pulse voltage is applied to the metal layer of the resistor element to generate the test resonance wave, and whether the metal layer contains the impurities or not can be judged by comparing the test...
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| Format: | Patent |
| Sprache: | chi ; eng |
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| Zusammenfassung: | According to the method for detecting the impurities in the metal layer of the resistor element, the pulse voltage is applied to the metal layer of the resistor element to generate the test resonance wave, and whether the metal layer contains the impurities or not can be judged by comparing the test resonance wave with the standard resonance wave.
本发明提供了一种电阻元件金属层杂质的检测方法，在电阻元件金属层上施加脉冲电压以产生测试谐振波，将测试谐振波与标准谐振波进行比较可以用来判断金属层是否包含杂质。 |
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