SUBSTRATE PROCESSING APPARATUS, SUBSTRATE PROCESSING METHOD, GAS REGENERATION SYSTEM, AND GAS REGENERATION METHOD

Embodiments provide a substrate processing apparatus, a substrate processing method, a gas regeneration system, and a gas regeneration method capable of suppressing an increase in rare gas cost and reducing initial cost, maintenance cost, and the like of a gas regeneration facility. A gas regeneration method according to an embodiment includes setting a predetermined reference on the basis of a flow rate of a rare gas set in a process recipe, selecting a rare gas recovery step on the basis of the predetermined reference, in which exhaust gas from a predetermined chamber is guided to a rare gas regeneration facility, and in which the exhaust gas from the predetermined chamber is recovered from the rare gas regeneration facility. In a step other than the rare gas recovery step, the exhaust gas is kept away from the rare gas regeneration facility. 实施方式提供一种能够抑制稀有气体费用增大且降低气体再生设备的初始费用及维护成本等的衬底处理装置、衬底处理方法、气体再生系统、及气体再生方法。实施方式的气体再生方法包含如下操作：基于工艺配方中所设定的稀有气体的流量来设定规定的基准，基于所述规定的基准选定稀有气体回收步骤，在所述稀有气体回收步骤中，将来自规定腔室的排出气体导向稀有气体再