Tungsten-deposited diamond powder and composite copper powder material and preparation method thereof
The invention relates to a preparation method of a core-shell material for depositing tungsten on diamond powder, which comprises the following steps: a, putting the diamond powder into atomic layer deposition equipment, vacuumizing, setting the temperature to be 150-300 DEG C, and introducing Si2H6...
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Format: | Patent |
Sprache: | chi ; eng |
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Zusammenfassung: | The invention relates to a preparation method of a core-shell material for depositing tungsten on diamond powder, which comprises the following steps: a, putting the diamond powder into atomic layer deposition equipment, vacuumizing, setting the temperature to be 150-300 DEG C, and introducing Si2H6; b, introducing a cleaning gas to purge excessive Si2H6 and by-products; c, introducing WF6; d, introducing cleaning gas to purge excessive WF6 and by-products; e, introducing a reducing precursor; f, introducing cleaning gas to purge the excessive reducing precursor and by-products; and g, the steps c-f are repeated for 1-1000 times, and the diamond powder core-shell material with tungsten deposited on the surface is obtained. By means of the method, narrow holes in the diamond powder can be covered, accurate control over the film thickness is achieved by controlling the deposition period, the coating thickness reaches the nanometer level, meanwhile, atoms between atomic layers are connected through strong chemic |
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