Yttrium aluminum coating for plasma processing chamber components

A component of a plasma processing chamber has a coating on at least one surface, the coating comprising yttrium aluminum. The coating is an aerosol deposition coating formed from a powder mixture of yttrium oxide powder and aluminum-containing powder, and has a molar ratio of yttrium to aluminum of...

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Bibliographische Detailangaben

Hauptverfasser:	WETZEL DAVID JOSEPH, SRINIVASAN SATISH, KERNS JOHN MICHAEL, XU LIN, DAUGHERTY JOHN, KIRSCHEY, ROBIN
Format:	Patent
Sprache:	chi ; eng
Schlagworte:	BASIC ELECTRIC ELEMENTS CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS ELECTRICITY INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL METALLURGY SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION
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