Yttrium aluminum coating for plasma processing chamber components

A component of a plasma processing chamber has a coating on at least one surface, the coating comprising yttrium aluminum. The coating is an aerosol deposition coating formed from a powder mixture of yttrium oxide powder and aluminum-containing powder, and has a molar ratio of yttrium to aluminum of...

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Bibliographische Detailangaben
Hauptverfasser:	WETZEL DAVID JOSEPH, SRINIVASAN SATISH, KERNS JOHN MICHAEL, XU LIN, DAUGHERTY JOHN, KIRSCHEY, ROBIN
Format:	Patent
Sprache:	chi ; eng
Schlagworte:	BASIC ELECTRIC ELEMENTS CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS ELECTRICITY INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL METALLURGY SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION
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Beschreibung
Zusammenfassung:	A component of a plasma processing chamber has a coating on at least one surface, the coating comprising yttrium aluminum. The coating is an aerosol deposition coating formed from a powder mixture of yttrium oxide powder and aluminum-containing powder, and has a molar ratio of yttrium to aluminum of 4: 1 to 1: 4. The coating may be annealed to form a porous ternary oxide. 一种等离子体处理室的部件在至少一个表面上具有涂层，涂层包含钇铝。涂层为从氧化钇粉末和含铝粉末的粉末混合物所形成的气溶胶沉积涂层，且具有4:1至1:4的钇比铝的摩尔数比例。可对涂层进行退火以形成多孔性三元氧化物。