Uniformity control for radio frequency plasma processing systems
A radio frequency plasma processing system includes: a reaction chamber; a susceptor disposed in the reaction chamber; and a plurality of fanned plates deployed in azimuthal angles around the susceptor in a ring between the susceptor and the reaction chamber. 一种射频等离子体处理系统，包括：反应室；部署在反应室中的基座；以及在基座与反应室...
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| Zusammenfassung: | A radio frequency plasma processing system includes: a reaction chamber; a susceptor disposed in the reaction chamber; and a plurality of fanned plates deployed in azimuthal angles around the susceptor in a ring between the susceptor and the reaction chamber.
一种射频等离子体处理系统，包括：反应室；部署在反应室中的基座；以及在基座与反应室之间的环中在基座周围以方位角部署的多个扇形板。 |
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