Sputtering target material and preparation method thereof
The invention discloses a sputtering target material and a preparation method thereof. The sputtering target material comprises a target material body and a welding shell wrapping the bottom and the outer side of the target material body. The welding shell is tightly combined with the target materia...
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Format: | Patent |
Sprache: | chi ; eng |
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Zusammenfassung: | The invention discloses a sputtering target material and a preparation method thereof. The sputtering target material comprises a target material body and a welding shell wrapping the bottom and the outer side of the target material body. The welding shell is tightly combined with the target material body through friction stir welding or electron beam welding. The preparation method of the sputtering target material comprises the following steps: step 1, attaching a metal plate to the bottom of a target material body, and embedding a metal ring in the circumferential direction of the target material body, so that the target material body is embedded into a groove space formed by the metal plate and the metal ring; and 2, the metal ring, the target material body and the edge of the metal plate are welded, the metal plate and the bottom area of the target material body are welded, and then a welding shell wrapping the outer side and the bottom of the target material body is formed. The prepared sputtering targe |
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