Substrate surface grinding device

The present invention provides a substrate surface polishing apparatus, comprising: a polishing apparatus including a plurality of polishing rollers for polishing the surface of a substrate; and a substrate support member that supports the substrate, in which a rotation axis of the polishing roller is disposed so as to be inclined with respect to a rotation axis of an adjacent polishing roller. 本发明提供一种基板表面研磨装置，其包括：研磨装置，其包括对基板的表面进行研磨的多个研磨辊；以及基板支撑部件，其支撑所述基板，其中，所述研磨辊的旋转轴设置为与相邻的研磨辊的旋转轴相倾斜。