Broadband sensor of electromagnetic waves
A broadband sensor for a radio frequency plasma processing system includes a capacitive pickup for an electrical potential disposed on a conductive component of a reaction chamber. And a lead comprising a circuit connecting the pick-up to a connector, the connector being mounted in an electrical gro...
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Format: | Patent |
Sprache: | chi ; eng |
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Zusammenfassung: | A broadband sensor for a radio frequency plasma processing system includes a capacitive pickup for an electrical potential disposed on a conductive component of a reaction chamber. And a lead comprising a circuit connecting the pick-up to a connector, the connector being mounted in an electrical ground plate proximate the pick-up, a resistance of the circuit and a capacitance to an electrical ground of the connector being such that a pick-up voltage differs by less than 5% from a surface voltage of the conductive component; and an attenuator circuit connected to the connector comprising at least one current limiting resistor connected in series from an attenuator input to an attenuator output wherein the broadband sensor detects in a radio frequency range from about 10 kHz to at least about 1 GHz for radio frequency potential measurements in the radio frequency plasma processing system.
一种用于射频等离子体处理系统的宽带传感器,包括部署在反应室的导电部件上的用于电势的电容拾取器。以及,包括电路的引线,所述引线将所述拾取器连接到连接器,所述连接器安装在接近所述拾取器的电接地板中,所述电路的电阻和对所述连接器的电气地的电容使得拾取器电 |
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