Face confrontation mask sample generation method and system based on generative model

The invention provides a face confrontation mask sample generation method and system based on a generative model. The method comprises the following steps: constructing a face mask shape matrix according to face feature point positions in an adversarial face image, and simulating radian transformati...

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Hauptverfasser: WANG WEI, WANG JIANWEN, WANG LI, SONG ZONGZE, PENG BO, XIANG WEI, DONG JING
Format: Patent
Sprache:chi ; eng
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Zusammenfassung:The invention provides a face confrontation mask sample generation method and system based on a generative model. The method comprises the following steps: constructing a face mask shape matrix according to face feature point positions in an adversarial face image, and simulating radian transformation of a mask in a physical space through bending rotation mapping transformation to obtain an adversarial mask of a mask shape; generating a random face image based on the face generation model, processing the random face image by using an adversarial mask generation method to obtain mask shape adversarial disturbance, and combining the mask shape adversarial disturbance and the adversarial face image into an adversarial sample; and inputting the adversarial sample and the database face image into an attacked face recognition system network, and constructing an integral adversarial attack training network. According to the scheme provided by the invention, printing in a physical space can be realized, a face recogn