Capacitor integrated structure, capacitor unit and manufacturing method thereof
The invention discloses a capacitor integrated structure, a capacitor unit and a manufacturing method thereof, and the manufacturing method of the capacitor unit comprises the steps: forming a plurality of capacitor stacking structures on a substrate with an insulating layer, and executing a first c...
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Format: | Patent |
Sprache: | chi ; eng |
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Zusammenfassung: | The invention discloses a capacitor integrated structure, a capacitor unit and a manufacturing method thereof, and the manufacturing method of the capacitor unit comprises the steps: forming a plurality of capacitor stacking structures on a substrate with an insulating layer, and executing a first cutting process for an insulating interval part formed between two adjacent capacitor stacking structures, forming a plurality of grooves for exposing the first conductive part and the second conductive part of each capacitor stacking structure; filling each groove with a metal material to form a plurality of metal spacing parts electrically connected with the first conductive part and the second conductive part; and performing a second cutting process on each metal spacing part to form a plurality of independent capacitor units, and respectively forming metal side walls on two opposite sides of each capacitor unit to form a capacitor unit with two end electrodes. Therefore, there is no need to additionally add an e |
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