Film coating method applied to glass panel and glass panel

The invention discloses a coating method applied to a glass panel and the glass panel. Comprising the following steps that a substrate is provided, and the surface of the substrate is covered with an organic layer; the surface of the organic layer is coated with a layer of functional film through va...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser:	DONG JIAN, ZHENG CHANGKUN, YAO BENMING, LIU YONGSHENG, ZHENG JIANWAN, HUANG YONGXIANG
Format:	Patent
Sprache:	chi ; eng
Schlagworte:	CHEMICAL COMPOSITION OF GLASSES, GLAZES, OR VITREOUSENAMELS CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL GLASS INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL JOINING GLASS TO GLASS OR OTHER MATERIALS METALLURGY MINERAL OR SLAG WOOL SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS,MINERALS OR SLAGS SURFACE TREATMENT OF GLASS SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION
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Beschreibung
Zusammenfassung:	The invention discloses a coating method applied to a glass panel and the glass panel. Comprising the following steps that a substrate is provided, and the surface of the substrate is covered with an organic layer; the surface of the organic layer is coated with a layer of functional film through vacuum magnetron sputtering coating equipment, the vacuum magnetron sputtering coating equipment is provided with n coating cavities so that the functional film can be formed through n times of deposition, the thickness of the functional film deposited for the first time is smaller than or equal to 15% of the overall thickness of the functional film, and the thickness of the functional film deposited for the second time is smaller than or equal to 15% of the overall thickness of the functional film. And the thickness is less than each deposition thickness in the last several times. The functional film is formed by multiple times of deposition, the functional film deposited for the first time has the function of shiel