Method for detecting flatness of polishing film of double-sided polishing machine

The invention relates to a method for detecting the planeness of a polishing film of a double-sided polishing machine, which comprises the following steps of: measuring the planeness of the polishing film by using a tool consisting of two dial indicators and a hard gasket, and enabling a connecting...

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1. Verfasser: YU QINTAO
Format: Patent
Sprache:chi ; eng
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