Method for detecting flatness of polishing film of double-sided polishing machine

The invention relates to a method for detecting the planeness of a polishing film of a double-sided polishing machine, which comprises the following steps of: measuring the planeness of the polishing film by using a tool consisting of two dial indicators and a hard gasket, and enabling a connecting...

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Format: Patent
Sprache:chi ; eng
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Zusammenfassung:The invention relates to a method for detecting the planeness of a polishing film of a double-sided polishing machine, which comprises the following steps of: measuring the planeness of the polishing film by using a tool consisting of two dial indicators and a hard gasket, and enabling a connecting line of gauge heads of the two dial indicators to be tangent to an inner hole of the polishing film during measurement; therefore, the height relation of the inner ring, the outer ring and the middle position of the polishing film is determined according to the readings of the two dial indicators, and the polishing disc is specifically repaired according to the measurement result, so that the planeness of all parts of the surface of the polishing film is consistent, and the machining precision of the polishing disc is ensured. 本发明关于一种双面抛光机抛光膜平面度检测方法,其通过由两块千分表和硬质垫片组成的工装对抛光膜平面度进行测量,且在测量时使两块千分表表头的连线与抛光膜内孔相切,从而根据两块千分表的读数确定抛光膜内圈、外圈以及抛光膜中间位置的高度关系,并根据测量结果对抛光盘进行针对性的修复,使得抛光膜表面各处的平面度一致,保证抛光片的加工精度。