Washing-free facial mask essence facial mask and preparation process thereof
The invention discloses a wash-free facial mask essence mask and a preparation process thereof, and the wash-free facial mask essence mask comprises the following materials: a mask matrix, vitamin C, 60-80% of pure water, 1, 2, 4-trimethyl-1, 3-pentanediol monoisobutyrate, 1, 3-pentanediol The treme...
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Format: | Patent |
Sprache: | chi ; eng |
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Zusammenfassung: | The invention discloses a wash-free facial mask essence mask and a preparation process thereof, and the wash-free facial mask essence mask comprises the following materials: a mask matrix, vitamin C, 60-80% of pure water, 1, 2, 4-trimethyl-1, 3-pentanediol monoisobutyrate, 1, 3-pentanediol The tremella fuciformis oral liquid is prepared from the following components in percentage by weight: 3 to 6 percent of 1, 3-propylene glycol, 1 to 3 percent of erythritol, 1 to 3 percent of glycerol polyether-26, 0.5 to 2 percent of PEG/PPG-17/6 copolymer, 0.5 to 3 percent of propylene glycol, 0.3 to 0.5 percent of p-hydroxyacetophenone, 0.5 to 3 percent of glycerol, 0.1 to 0.3 percent of allantoin, 0.1 to 1 percent of dehydrated xylitol, 0.1 to 0.3 percent of hydrolyzed sclerotium gum and 0.1 to 0.2 percent of tremella fuciformis extract. Through cooperative use of the materials and the preparation process, the no-wash mask can be produced, so that essence on the mask resides on the surface of skin, the mask is more conv |
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