Method for inspecting sample and charged particle beam device
A charged particle beam apparatus for irradiating or inspecting a sample is described. A charged particle beam apparatus includes a charged particle beam source for generating a primary charged particle beam and a multi-aperture lens plate having a plurality of apertures for forming four or more pri...
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Format: | Patent |
Sprache: | chi ; eng |
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Zusammenfassung: | A charged particle beam apparatus for irradiating or inspecting a sample is described. A charged particle beam apparatus includes a charged particle beam source for generating a primary charged particle beam and a multi-aperture lens plate having a plurality of apertures for forming four or more primary apertures. Two or more electrodes (e.g., each electrode having an opening) are provided with one opening for a primary charged particle beam or four or more primary sub-beams. The charged particle beam apparatus further comprises a collimator for deflecting a first primary beamlet, a second primary beamlet, a third primary beamlet, and a fourth primary beamlet of the four or more primary beamlets relative to each other. The charged particle beam apparatus further comprises an objective unit having three or more electrodes, each electrode having an opening for four or more primary beamlets. The charged particle beam apparatus further includes a platform for supporting the sample.
描述了一种用于辐照或检查样本的带电粒子束装置。带电粒子束装置包 |
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