Process edge manufacturing method, grating manufacturing method and grating manufacturing device

The invention relates to a process edge manufacturing method, a grating manufacturing method and a grating manufacturing device.The process edge manufacturing method comprises the steps that a selected process edge area on a to-be-photoetched base material is exposed and developed through a light be...

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Bibliographische Detailangaben
Hauptverfasser: DONG WENHAO, MAO XINYU, SHEN BIYAO, ZHAO YUXUAN
Format: Patent
Sprache:chi ; eng
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Beschreibung
Zusammenfassung:The invention relates to a process edge manufacturing method, a grating manufacturing method and a grating manufacturing device.The process edge manufacturing method comprises the steps that a selected process edge area on a to-be-photoetched base material is exposed and developed through a light beam with the controllable projection area and/or area, and a process edge is obtained; wherein the vibration characteristic of the process edge is consistent with that of other areas of the to-be-photoetched base material. According to the method, a reference grating is combined with a sample, and a process edge for replacing the reference grating is manufactured on the sample, namely, the reference grating is manufactured at a certain position of a to-be-photoetched base material, then the reference grating is used for scanning and locking, and the grating required by exposure is scanned at another position of the to-be-photoetched base material. Therefore, the sample and the locking reference light are emitted fro