Linear motion mechanism and particle scattering suppression method

The present invention provides a linear motion mechanism comprising: an internal moving body which is provided in a housing, the inside of which can be vented, moves linearly, and moves an external moving body outside the housing, the external moving body being connected to a connection part extendi...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	IIDA NARUAKI, SASAKI KEISUKE, AKIMOTO MASAMI, IDE YASUMORI, MATSUSHITA KAZUYA, YASUTAKE TAKAHIRO, NAKASHIMA TSUNENAGA, OZEKI MASATO
Format:	Patent
Sprache:	chi ; eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CINEMATOGRAPHY ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES
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