Valve heat insulation device of epitaxial furnace and epitaxial furnace
The invention belongs to the technical field of epitaxial growth, and particularly relates to a valve heat insulation device of an epitaxial furnace and the epitaxial furnace, the valve heat insulation device of the epitaxial furnace comprises a flange used for connecting a reaction chamber of the e...
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Format: | Patent |
Sprache: | chi ; eng |
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Zusammenfassung: | The invention belongs to the technical field of epitaxial growth, and particularly relates to a valve heat insulation device of an epitaxial furnace and the epitaxial furnace, the valve heat insulation device of the epitaxial furnace comprises a flange used for connecting a reaction chamber of the epitaxial furnace and a transmission valve of the epitaxial furnace, and the flange is provided with a transmission port used for substrate feeding and discharging; the heat insulation baffle is movably mounted on one side, close to the reaction chamber, of the flange; the driving mechanism is mounted on the flange, is connected with the heat insulation baffle and is used for driving the heat insulation baffle to move according to the operation state of the reaction chamber so as to shield or open the transmission port; the device can utilize the driving mechanism to drive the heat insulation baffle to move according to the operation state of the reaction chamber so as to shield or open the transmission port on the |
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