Processing technology for ensuring etching speed
The invention relates to a processing technology capable of ensuring etching speed, which comprises an etching base, an etching groove and an electric cabinet, the etching base is provided with the etching groove, a sliding rail is arranged above the etching groove, the sliding rail is provided with...
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Format: | Patent |
Sprache: | chi ; eng |
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Zusammenfassung: | The invention relates to a processing technology capable of ensuring etching speed, which comprises an etching base, an etching groove and an electric cabinet, the etching base is provided with the etching groove, a sliding rail is arranged above the etching groove, the sliding rail is provided with a mobile manipulator, the lower end of the mobile manipulator is provided with a clamping platform, and the clamping platform is provided with a clamping groove. An induction support is installed on the left side of a tank body of the etching tank, a Baume hydrometer sliding up and down is vertically installed in the induction support, the Baume hydrometer is sleeved with a sleeve support sliding relative to the induction support, and a first liquid storage tank and a second liquid storage tank are arranged on the lower portion of the etching tank. And micropump brackets are vertically mounted on the first liquid storage tank and the second liquid storage tank. The device has the characteristics of improving the p |
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