Thick photoresist layer metrology target

A metrology target includes a first target structure formed within at least one of a first region and a third region of a first layer of a sample, where the first target structure includes a plurality of first cells including one or more first cell pattern elements; and a second target structure formed within at least one of a second region and a fourth region of a second layer of the sample, the second target structure comprising a plurality of second cells comprising one or more second cell pattern elements. 一种计量目标包含：第一目标结构，其形成于样本的第一层的第一区域及第三区域中的至少一者内，其中所述第一目标结构包括含有一或多个第一单元图案元件的多个第一单元；及第二目标结构，其形成于所述样本的第二层的第二区域及第四区域中的至少一者内，所述第二目标结构包括含有一或多个第二单元图案元件的多个第二单元。