LITHOGRAPHY EXPOSURE SYSTEM AND METHOD THEREFOR

A lithographic exposure system and a method therefor. The method for a lithographic exposure system includes forming a photocatalyst material on an inner wall of an exposure chamber of an exposure apparatus. An integrated circuit wafer is transferred into the exposure chamber. Coating a photoresist liquid on the integrated circuit wafer; and performing an exposure process on the photoresist liquid. And the photocatalyst material catalyzes vapor of the photoresist liquid to generate reaction. 一种微影曝光系统及用于该系统的方法，用于微影曝光系统的方法包括在一曝光设备的曝光腔室的内壁形成光触媒材料。传送一集成电路晶圆进入曝光腔室。涂布光阻液于集成电路晶圆上。对光阻液执行曝光制程。通过光触媒材料催化光阻液的蒸气产生反应。